Semiconductor wafer processing equipment, namely, thermal treatment reactors, chemical vapor deposition reactors, and plasma-enhanced chemical vapor deposition reactors; electronically operated apparatus for the manufacture of semiconductors and for the deposition of thin films on semiconductor wafers by chemical vapor deposition or plasma-enhanced chemical vapor deposition, as well as components and replacement parts thereof

'apparatus':23 'chemic':9,17,40,47 'compon':53 'deposit':11,19,32,42,49 'electron':21 'enhanc':16,46 'equip':4 'film':35 'manufactur':26 'name':5 'oper':22 'part':56 'plasma':15,45 'plasma-enhanc':14,44 'process':3 'reactor':8,12,20 'replac':55 'semiconductor':1,28,37 'thereof':57 'thermal':6 'thin':34 'treatment':7 'vapor':10,18,41,48 'wafer':2,38 'well':51

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