Optical inspection system for semiconductor wafers in various stages of processing, said system comprised of imaging cameras, optical filters, control computer, and monochromatic illumination source comprised of laser and LED light sensors, the foregoing used to illuminate semiconductor wafers by ultra violet, infra-red and visible light, and thereby to acquire a spatial or spatial/spectral image of the band-edge luminescence emitted by the wafer using an imaging camera

'acquir':52 'band':61 'band-edg':60 'camera':17,71 'compris':14,26 'comput':21 'control':20 'edg':62 'emit':64 'filter':19 'forego':34 'illumin':24,37 'imag':16,57,70 'infra':44 'infra-r':43 'inspect':2 'laser':28 'led':30 'light':31,48 'luminesc':63 'monochromat':23 'optic':1,18 'process':11 'red':45 'said':12 'semiconductor':5,38 'sensor':32 'sourc':25 'spatial':54 'spatial/spectral':56 'stage':9 'system':3,13 'therebi':50 'ultra':41 'use':35,68 'various':8 'violet':42 'visibl':47 'wafer':6,39,67

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