metal organic chemical vapor deposition reactor and gas distribution system comprising a water-cooled reaction chamber, gas injection flange, high temperature heating system, high vacuum loadlock chamber, alkyl and hydride injection manifolds and flow distribution tubing in the nature of production platforms for use in the manufacture of gallium nitride-based laser diodes

'alkyl':29 'base':53 'chamber':17,28 'chemic':3 'compris':11 'cool':15 'deposit':5 'diod':55 'distribut':9,36 'flang':20 'flow':35 'gallium':50 'gas':8,18 'heat':23 'high':21,25 'hydrid':31 'inject':19,32 'laser':54 'loadlock':27 'manifold':33 'manufactur':48 'metal':1 'natur':40 'nitrid':52 'nitride-bas':51 'organ':2 'platform':43 'product':42 'reaction':16 'reactor':6 'system':10,24 'temperatur':22 'tube':37 'use':45 'vacuum':26 'vapor':4 'water':14 'water-cool':13

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