Equipment, machines and monitoring devices, namely, epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, integrated metrology systems, chemical mechanical polishers and operational software, all for the processing and production of semiconductor substrates, thin films, silicon discs and wafers

'chemic':9,24 'deposit':11,15 'devic':5 'disc':42 'epitaxi':7 'equip':1 'etcher':18 'film':40 'implant':20 'integr':21 'ion':19 'machin':2 'mechan':25 'metrolog':22 'monitor':4 'name':6 'oper':28 'physic':13 'plasma':17 'polish':26 'process':33 'product':35 'reactor':8,12,16 'semiconductor':37 'silicon':41 'softwar':29 'substrat':38 'system':23 'thin':39 'vapor':10,14 'wafer':44

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