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SPIRE

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U.S. federal trademark · Serial No. 73529852 · Reg. No. 1396276

Mark
SPIRE
Status
Registered
Serial Number
73529852
Registration No.
1396276
Filing Date
April 1, 1985
Registration Date
June 10, 1986
Class(es)
Class 001, Class 007, Class 009, Class 040, Class 042

Owners

SPIRE SOLAR, LLC
16 · TYNGSBORO, MA, US
SPIRE SOLAR, LLC
03 · WOBURN, MA, US
SPIRE CORPORATION
03 · BEDFORD, MA, US
SPIRE CORPORATION
03 · BEDFORD, MA, US
SPIRE CORPORATION
03 · BEDFORD, MA, US

Goods & Services

MATERIAL WEAR TESTING SERVICES; SEMICONDUCTOR MATERIAL AND MODULE TESTING SERVICES

[ MANUFACTURING SYSTEMS, NAMELY, AUTOMATED AND MANUAL MANUFACTURING MACHINES FOR PRODUCTION OF SOLAR CELLS, PHOTOVATAIC ARRAYS AND PHOTOVOLTAIC MODULES, AND LAMINATING MACHINES ]

[SCIENTIFIC, ELECTRONIC, AND PHOTOVOLTAIC SYSTEMS AND DEVICES, NAMELY, SOLAR CELLS, CONCENTRATOR SOLAR CELLS, THIN FILM SOLAR CELLS, SOLAR CELL MODULES, SOLAR CELL ARRAYS, ALL COMPOSED OF SILICON AND GALLIUM ARSENIDE; POWER TRANSISTORS, PRESSURE SENSORS, TEXTURE ETCHERS, PHOTODIODE ARRAYS, LIGHT EMITTING DIODES, METAL OXIDE SEMICONDUCTOR STRUCTURES, JUNCTION FIELD EFFECT TRANSISTORS, AND VARACTOR DIODES; AND, MATERIALS PROCESSING DEVICES, NAMELY, ION IMPLANTERS, PULSED ELECTRON BEAM PROCESSORS, ELECTROSTATIC BONDERS, ELECTRON BEAM EVAPORATORS, METALORGANIC CHEMICAL VAPOR DEPOSITION REACTORS, PLASMA DEPOSITION INSTURMENTS, ION BEAM DEPOSITION PROCESSORS, INDUSTRIAL X-RAY SOURCES, ELECTRON PARTICLE ACCELERATORS, DOSIMETRY ANALYZERS, ELECTRON BEAM GENERATORS, PLASMA GENERATORS, PHOTOVOLTAIC MODULE LAMINATORS, ] PHOTOVOLTAIC MODULE TESTING INSTRUMENTS, SEMICONDUCTOR TESTERS

[ CHEMICALS AND CHEMICAL COMPOSITIONS, NAMELY, SEMICONDUCTOR, ELECTRONIC AND THIN FILM COMPOSITIONS, NAMELY, SILICON, PROCESSED AMORPHOUS SILICON, CAST SILICON SUBSTRATE, POLYSILICON FILM, RECRYSTALIZED THIN FILM SILICON, SILICON HETEROSTRUCTURES, EPITAXIAL SILICON FILM, GRAPHOEPITAXY, GALLIUM ARSENIDE, GERMANIUM, PLASMA DEPOSITED THIN FILM, CHEMICAL VAPOR DEPOSITED THIN FILM, VACUUM VAPOR DEPOSITEDTHIN FILM, ION IMPLANTED COMPOSITIONS, NAMELY, SILICON, PLATINUM, CHROMIUM, TANTALUM, CARBON, NITROGEN, ALUMINUM, YTTRIUM, TITANIUM, ION BEAM DEPOSITION COMPOSITIONS AND COATINGS, CUBIC BORON NITRIDE, ANNEALED COMPOSITIONS, SINTERED COMPOSITIONS, PHOTOLITHOGRAPHED COMPOSITIONS, SPUTTERED COMPOSITIONS, ETCHED COMPOSITIONS, AND ELECTROSTATIC COMPOSITIONS, FOR USE IN THE RESEARCH, MANUFACTURE, AND PROCESSING OF MATERIALS, PRODUCTS, AND DEVICES BY THE PHOTOVOLTAICS, ELECTRONICS AND METAL SURFACE MODIFICATION INDUSTRIES ]

[ PHYSICAL/CHEMICAL PROCESSING SERVICES, NAMELY, ION IMPLANTATION SERVICES, ION BEAM DEPOSITION SERVICES, EPITAXIAL DEPOSITION SERVICES, ION BEAM SPUTTERING SERVICES, PLASMA DEPOSITION SERVICES, PULSED ELECTRON BEAM PROCESSING, SEMICONDUCTOR DOSING SERVICES ]

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Source: USPTO federal trademark records. Informational only, not legal advice. Status and details may lag the live USPTO database.