SEMICONDUCTOR WAFER PROCESSING EQUIPMENT AND COMPONENTS, NAMELY, EPITAXIAL REACTORS, CHEMICAL VAPOR DEPOSITION REACTORS, PHYSICAL VAPOR DEPOSITION REACTORS, PLASMA ETCHERS, ION IMPLANTERS, AND CHEMICAL MECHANICAL POLISHERS, ALL FOR THE PROCESSING AND PRODUCTION OF SEMICONDUCTOR SUBSTRATES, THIN FILMS, SILICON DISCS AND WAFERS; AND OPERATIONAL SOFTWARE TO OPERATE THE AFOREMENTIONED SEMICONDUCTOR WAFER PROCESSING EQUIPMENT AND COMPONENTS

'aforement':47 'chemic':10,23 'compon':6,53 'deposit':12,16 'disc':38 'epitaxi':8 'equip':4,51 'etcher':19 'film':36 'implant':21 'ion':20 'mechan':24 'name':7 'oper':42,45 'physic':14 'plasma':18 'polish':25 'process':3,29,50 'product':31 'reactor':9,13,17 'semiconductor':1,33,48 'silicon':37 'softwar':43 'substrat':34 'thin':35 'vapor':11,15 'wafer':2,40,49

SYNEXIS

Owners

Goods & Services