Semiconductor wafer processing equipment and components, namely, - epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, and chemical mechanical polishers; all for the processing and production of semiconductor substrates, thin films, silicon discs and wafers

'chemic':10,23 'compon':6 'deposit':12,16 'disc':38 'epitaxi':8 'equip':4 'etcher':19 'film':36 'implant':21 'ion':20 'mechan':24 'name':7 'physic':14 'plasma':18 'polish':25 'process':3,29 'product':31 'reactor':9,13,17 'semiconductor':1,33 'silicon':37 'substrat':34 'thin':35 'vapor':11,15 'wafer':2,40

TANOX

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