Equipment and machines for the processing of semiconductor substrates, thin films, and silicon wafers, namely, machines for thin-film coating, using atomic layer deposition, the surface of semiconductor substrates, silicon wafers, and machines for manufacturing thin films, using atomic layer deposition, for semiconductor substrates

'atom':23,40 'coat':21 'deposit':25,42 'equip':1 'film':11,20,38 'layer':24,41 'machin':3,16,34 'manufactur':36 'name':15 'process':6 'semiconductor':8,29,44 'silicon':13,31 'substrat':9,30,45 'surfac':27 'thin':10,19,37 'thin-film':18 'use':22,39 'wafer':14,32

TEPHRA

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