Machinery and parts thereof for coating articles by means of physical vapour deposition, chemical vapour deposition, including atomic layer deposition or a combination of physical vapour deposition and chemical vapour deposition; arc coating machines and parts therefor; vacuum generation pumps; sputtering machines and parts therefor; magnetron sputtering machines and parts therefor; sputtering machines and parts therefor, namely, sputtering sources and magnetron sputtering sources

'arc':32 'articl':7 'atom':18 'chemic':14,29 'coat':6,33 'combin':23 'deposit':13,16,20,27,31 'generat':39 'includ':17 'layer':19 'machin':34,42,48,53 'machineri':1 'magnetron':46,61 'mean':9 'name':57 'part':3,36,44,50,55 'physic':11,25 'pump':40 'sourc':59,63 'sputter':41,47,52,58,62 'therefor':37,45,51,56 'thereof':4 'vacuum':38 'vapour':12,15,26,30

Treatment chambers of metal for physical or chemical coating equipment

'chamber':2 'chemic':8 'coat':9 'equip':10 'metal':4 'physic':6 'treatment':1

Targets of metal or ceramics, being cathodes, for magnetron sputtering sources; targets of metal or ceramics, being cathodes, for arc sources

'arc':20 'cathod':7,18 'ceram':5,16 'magnetron':9 'metal':3,14 'sourc':11,21 'sputter':10 'target':1,12

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