U.S. federal trademark · Serial No. 77614482 · Reg. No. 3764702
Glass substrates for photomasks used to form fine patterns, namely, glass substrates for photomasks used to form semiconductor integrated circuits, and glass substrates for photomasks used to form liquid crystal display circuits; Mask blanks for semiconductor integrated circuits; Phase shift mask blanks for semiconductor integrated circuits; Substrates used for processing in MEMS (micro electro mechanical systems); Substrates used for processing in MEMS (micro electro mechanical systems) for DNA analysis or chemical analysis
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