GLASS FOR THE MANUFACTURING OF PHOTOMASKS TO BE USED IN THE FABRICATION OF PRINTED CIRCUIT BOARDS AND DISPLAYS; GLASS COMPONENT FOR EQUIPMENTS TO BE USED IN PHOTOLITHOGRAPHY AND REPROGRAPHY APPLICATIONS; GLASS FOR THE SHIELDING OF OPTICAL DETECTORS AND OPTICAL EMITTERS WORKING IN THE RANGES OF ULTRA-VIOLET, VISIBLE AND INFRA-RED LIGHT

'applic':30 'board':16 'circuit':15 'compon':20 'detector':37 'display':18 'emitt':40 'equip':22 'fabric':12 'glass':1,19,31 'infra':52 'infra-r':51 'light':54 'manufactur':4 'optic':36,39 'photolithographi':27 'photomask':6 'print':14 'rang':44 'red':53 'reprographi':29 'shield':34 'ultra':47 'ultra-violet':46 'use':9,25 'violet':48 'visibl':49 'work':41

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