Semiconductor Wafer Processing Equipment; namely; epitaxial reactors, chemical vapor deposition reactors, physical vapor deposition reactors, plasma etchers, ion implanters, chemical mechanical polishers, and semiconductor wafer process diagnostic and control equipment in the nature of optical and charged particle units for the inspection, review, and measurement of semiconductor elements

'charg':37 'chemic':8,20 'control':29 'deposit':10,14 'diagnost':27 'element':48 'epitaxi':6 'equip':4,30 'etcher':17 'implant':19 'inspect':42 'ion':18 'measur':45 'mechan':21 'name':5 'natur':33 'optic':35 'particl':38 'physic':12 'plasma':16 'polish':22 'process':3,26 'reactor':7,11,15 'review':43 'semiconductor':1,24,47 'unit':39 'vapor':9,13 'wafer':2,25

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