SEMICONDUCTOR WAFER PROCESSING EQUIPMENT, NAMELY-- EPITAXIAL REACTORS; CHEMICAL VAPOR DEPOSITION REACTORS; PHYSICAL VAPOR DEPOSITION REACTORS; PLASMA ETCHERS; ION IMPLANTERS; CHEMICAL MECHANICAL POLISHERS; AND MACHINES USED TO MANUFACTURE SEMICONDUCTOR SUBSTRATES, SILICON DISCS, AND SILICON WAFERS

'chemic':8,20 'deposit':10,14 'disc':31 'epitaxi':6 'equip':4 'etcher':17 'implant':19 'ion':18 'machin':24 'manufactur':27 'mechan':21 'name':5 'physic':12 'plasma':16 'polish':22 'process':3 'reactor':7,11,15 'semiconductor':1,28 'silicon':30,33 'substrat':29 'use':25 'vapor':9,13 'wafer':2,34

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