U.S. federal trademark · Serial No. 78860347 · Reg. No. 004980546
Services in the field of electron beam writing, namely, research, development, [ consultancy ] and customized exposure via focused electrons on solid state substrates, including Si, GaAs, InP, SiC, GaN and diamond; services in the field of process technology, namely, research, development [, and consultancy ] of structures in dimensions within the range of 5nm and 250nm [ ; design of, and technical support, namely, troubleshooting of problems, maintenance, and update for software for electron beam writing and process technology, in particular for simulating and optimizing high-resolution electron beam writing and nanometer process technologies ]
[ Software for electron beam writing and process technology, in particular for simulating and optimizing high-resolution electron beam writing and nanometer process technologies; ] master substrates for high-resolution and ultra high-resolution replication technologies, namely, semiconductors, quartz and glass for use in patterning at nano scale or near nano scale; reference standards, namely, measurement standard devices for nanometrology, namely, measuring tools having a pattern in the micrometer or nanometer ranges; high-resolution masks and reticles for use in transferring patterns on wafers and other substrates
Production, namely, custom manufacture of structures in dimensions within the range of 5nm and 250nm
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