U.S. federal trademark · Serial No. 75431428 · Reg. No. 2381760
Organic, anti-reflective chemicals which abort substantially all light at i-line exposure, and used in the manufacture of microelectronic substrates which are subjected to either wet or dry microlithographic patterning
Source: USPTO federal trademark records. Informational only, not legal advice. Status and details may lag the live USPTO database.