U.S. federal trademark · Serial No. 76310236 · Reg. No. 2123172
Services in the field of electron beam writing, in particular research, development, consulting and customized exposure via focused electrons on solid state substrates, for example, silicon (Si), gallium arsenide (GaAs), indium phosphide (InP), silicon carbide (SiC), gallium nitride (GaN) and diamond; services in the field of process technology, in particular, research, development and consulting related to structures between 5nm and 250nm; development and support of software for electron beam writing and process technology, in particular for simulation and optimization of high resolution electron beam writing and of nanometer process technologies
Software for electron beam writing and process technology, in particular for simulation and optimization of high-resolution electron beam writing and of nanometer process technologies; master substrates for high resolution and ultra high-resolution replication technologies; measurement standards for nanometrology, namely solid state substrates having a pattern in the nanometer or micrometer regime high-resolution masks and reticles
Custom manufacturing for others of structures having dimensions between 5nm and 250nm, namely, semiconductors, superconductors, molecular aggregates, polymer structures and metals
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